Dusemund Pte Ltd was set up in July 2003. The company is located at the German Centre.
Dr. Claus Dusemund has worked as a lab leader in R&D and as an engineer and senior technical adviser in the semiconductor and chemical industry. He realized that the combination of specialty products from small European high-tech companies with chemical-technical know-how was a good business concept for South East Asia.
Dusemund Pte Ltd provides technical consultancy in the field of semiconductor manufacturing (wet processes, chemical distribution systems and high purity materials)., materials and analytical methods especially in high purity chemicals, semiconductor and flat panel display industries and offers products from selected European companies in Asia, along with the application support for these products. Our main products are the chemical withdrawal systems for high purity chemicals, wafer handling systems from “AS strömungstechnik ” in Germany.
Dusemund Pte Ltd is the representative and exclusive distribution partner for “AS Strömungstechnik GmbH” in Asia. Together we develop customized solutions for specific applications. Over the years, we became one of the leading suppliera for chemical withdrawals systems for SME’s and many MNC’s in Asia.
Milestones & Achievements in the field of Semiconductor Industry:
Consultancy:
2004-2008: Chemical-Technical Consultancy for Mitsui Electronics Asia, Process support and engineering for wet-etch process at AFPD site.
2004-2005: Chemical-Technical Consultancy for MERCK EM Singapore.
2005-recent: Chemical-Technical Consultancy for MABAT Systems in Israel
Design of chemical dispense systems, material knowledge, commissioning and/or Maintenance of MABAT SDI in Asia/Pacific at following sites In:
Singapore: Services at – Bedok New Water, Hyflux, Micron (formerly Tech), Seraya Power Plant, Siltronic, SSMC, Sungei Tampines .
Overseas: US Naval Base in Yokosuka/Japan (March 2008), Exxon-Mobile refinery in Adelaide/Australia (Oct. 2008), Penneshaw on Kangaroo island/ Australia (Nov 2009), KENYA Water Plant in Chinchilla/Australia (May 2013), HMEL in Bathinda/India (Nov. 2013), Al Dur Water Plant in Bahrain (Nov. 2013), Sohar II & Barka III in Oman (August 2014), SIPC in Sohar/ Oman (April 2015), RKB refinery in Leuna/Germany (July 2015)
2007-2012: Chemical-Technical Consultancy for BASF SEA. Process support for wet chemical processes, troubleshooting, training for wet-processes in the semiconductor industry
Further: e.g. Chemical Safety training for M+W Zander (Singapore), JULPHAR (UAE), Training for Analytical methods (on-site) for KINETICS.
Patent PCT/IB2011/050091, Issued January 10, 2011
Distributor for AS Strömungstechnik GmbH in Asia:
In the last 20 years, we could achieve, that the AS QC2 chemical withdrawal system “QC-system” has been becoming one of the market leaders in the semiconductor and PV industry all over Asia, esp. Singapore, Malaysia, Taiwan and mainland China. In September, we’ll participated again at the SEMICON show in Taiwan.
Dusemund Pte Ltd is also local distributor in Singapore & Malaysia for:
PC Cell (Germany)
Publications:
Selective fluoride recognition with ferroceneboronic acid
Journal of the Chemical Society, Chemical Communications 1995
Dusemund, K. R. A. Sandanayake and S. Shinkai, J. Chem. Soc., Chem. Commun. 3, 333 (1995).Redox active ferroceneboronic acid 1 has excellent selectivity in the electrochemical recognition of fluoride ions in the presence of other halides and common anions.
Selective Molecular Recognition of Disaccharides by a Biphenyldiboronic Acid at the Air – Water Interface
Dusemund, M. Mikami and S. Shinkai, Chem. Lett., 157 (1995).A biphenyldiboronic acid derivative can be used for molecular recognition of disaccharides at the air-water interface. Disaccharides are detected selectively because of the fixed distance between the boronic acid moieties in the molecule and the organized structure of the monolayer.
Investigations on Conducting Polymer Films with a Fast Electrochemical Quartz Crystal Microbalance
Dusemund, G. Schwitzgebel, Ber. Bunsenges. Phys. Chem. 95, 1543 (1991).A fast electrochemical quartz crystal microbalance (EQCM) is presented, by means of which it is possible to obtain a resolution of a few nanograms within a measuring time of one millisecond. So, mass changes accompanying cyclic voltammetry (CV) of high scan rates as well as step experiments can be recorded
Ion-exchange properties of conducting polypyrrole films
Dusemund, G. Schwitzgebel, Synth. Met. 55-57, 1396 (1993).By the aid of a fast electrochemical quartz crystal microbalance (EQCM) it is possible to obtain a resolution in the range of nanograms with measuring times of one millisecond, enabling us to use high scan rates (some volts/second) in the cyclic voltammetry (CV).
Yamamoto, A. Ori, K. Ueda, C. Dusemund and S. Shinkai, J. Chem. Soc., Chem. Commun., 407(1996).F– and saccharides which feature specific affinity with the bornic acid group can be detected visually by the redox reaction between ferrocenylboronic acid derivatives and dyes with the appropriate redox potentials.
Quantification and Characterization of Organic Impurities in Semiconductor-Grade Hydrogen Peroxide with a Direct Chromatographic Method
Huber SA, Oeter D, Dusemund C, et al., “Quantification and Characterization of Organic Impurities in
Semiconductor-Grade Hydrogen Peroxide with a Direct Chromatographic Method,” in Chemical Proceedings of the SPWCC, Sunnyvale, CA, Balazs Analytical Laboratory, pp 15—30, 1997.
Patents:
System for conveying liquids without pulsing
Germany Patent PCT/EP1999/009408, Issued December 2, 1999
Inventors: Claus Dusemund, Alberto Dix, Klaus Freissler, Wilfried Jammer, Michael Poth, Eberhard Tempel
The invention relates to a pressurised system for conveying liquids without pulsing. The inventive system can be used for highly pure liquid chemicals in the semiconductor industry.
Chemicals supply system and its use
Germany Patent PCT/EP1998/002035, Issued October 29, 1998
Inventors: Claus Dusemund, Ulrich Finkenzeller, Thomas Schwortschik
A new chemicals supply system allows solid-containing suspensions, useful for example for polishing wafers or in the semiconductor manufacture, to be prepared directly at their utilisation site.
Buffer solutions for suspensions used in chemical-mechanical polishing
Germany Patent PCT/EP1998/002209, Issued October 29, 1998
Inventors: Claus Dusemund, Martin Hostalek, Rudolf Rhein, Manuela Schweikert
The present invention relates to buffer systems in the form of solutions or the salts thereof for the production of suspensions that can be used in chemical-mechanical polishing. Said buffer systems can be particularly used in the production of suspensions with a high pH value ranging from 9,5 to 13. Said suspensions can be used for chemical-mechanical polishing of silicium and metal surfaces of semiconductors, i.e. wafers. less
Method for the purification of hydrogen peroxide solutions
Germany Patent PCT/EP2001/003584, Issued March 29, 2001
Inventors: Claus Dusemund, Klaus Freissler, Martin Hostalek, Ewald Neumann, Dietmar Oeter
The invention relates to a novel chromatographic process for the further purification of hydrogen peroxide solutions, giving high-purity solutions which can be employed in semiconductor technology under today’s high purity requirements.
Monitoring apparatus and method for in-situ measurement of wafer thicknesses for monitoring the thinning of semiconductor wafers and thinning apparatus comprising a wet etching apparatus and a monitoring apparatus
Germany Patent PCT/IB2011/050091, Issued January 10, 2011
Inventors: Claus Dusemund, Martin Schoenleber, Berthold Michelt, Christoph Dietz
According to the invention, a monitoring device (12) is created for monitoring a thinning of at least one semiconductor wafer (4) in a wet etching unit (5), wherein the monitoring device (12) comprises a light source (14), which is designed to emit coherent light of a light wave band for which the semiconductor wafer (4) is optically transparent. The monitoring device (12) further comprises a measuring head (13), which is arranged contact-free with respect to a surface of the semiconductor wafer (4) to be etched, wherein the measuring head (13) is designed to irradiate the semiconductor wafer (4) with the coherent light of the light wave band and to receive radiation (16) reflected by the semiconductor wafer (4). Moreover, the monitoring device (12) comprises a spectrometer (17) and a beam splitter, via which the coherent light of the light wave band is directed to the measuring head (13) and the reflected radiation is directed to the spectrometer (17). The monitoring device (12) further comprises an evaluation unit (18), wherein the evaluation unit (18) is designed to determine a thickness d(t) of the semiconductor wafer (4) from the radiation (16) reflected by the semiconductor wafer (4) during thinning of the semiconductor wafer (4) by means of a method that is selected from the group consisting of a 1D-se FDOCT method, a 1D-te FDOCT method and a 1D-se TDOCT method.
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